HfO2-Based Ferroelectric Materials
Fabrication, Characterization and Device Applications
HfO2-Based Ferroelectric Materials
Fabrication, Characterization and Device Applications
provides the ideas of the material properties as well as the working principles of the devices based on HfO2 ferroelectrics.
Chapter 1 Fundamentals of ferroelectricity and ferroelectric materials
Chapter 1 Fundamentals of ferroelectricity and ferroelectric materials
Chapter 2 Oxygen Vacancy-induced Ferroelectricity in HfO2
Chapter 3 Origin and Multiple Regulations of Ferroelectric Properties in HfO2-Based Materials
Chapter 4 Design of HfO2 ferroelectric materials with superlattice-like laminate structure
Chapter 5 High energy-efficiency computing applications for HfO2-based ferroelectric materials
Chapter 6 1T1C HfO2 FeRAM Materials
Chapter 7 3D Ferroelectric Capacitor Memories for Data-Centric Computing
Chapter 8 Basic Mechanism of Si-channel HfO2-FeFET and its reliability
Chapter 9 Reliability of the Hafnia-based Ferroelectric Memory
Chapter 10 Reliability of HfO2-based ferroelectric thin films and field-effect transistors
Chapter 11 Hafnia-based Materials for Neuromorphic Devices
Chapter 13 HfO2-based Ferroelectric Materials for Energy Storage Applications
Chapter 14 HfO2-based Ferroelectric Materials for Piezoelectric Applications
Lu, Xubing
| ISBN | 9783527353187 |
|---|---|
| Article number | 9783527353187 |
| Media type | Book |
| Edition number | 1. Auflage |
| Copyright year | 2026 |
| Publisher | Wiley-VCH |
| Length | 500 pages |
| Illustrations | 100 SW-Abb., 50 Farbabb. |
| Language | English |
