Explores HfO2-based ferroelectrics for memory, sensing, and advanced electronic applications
 
Ferroelectric hafnium oxide (HfO2)-based materials have transformed the field of electronic materials and device design, offering pathways to overcome long-standing barriers in scalability, compatibility, and reliability. The emergence of robust ferroelectricity in doped HfO2 has revolutionized both research and industry perspectives, providing a viable solution where conventional ferroelectrics often fell short.
 
With contributions from leading experts, HfO2-Based Ferroelectric Materials addresses the critical need for a consolidated reference on HfO2-based ferroelectrics, offering foundational knowledge as well as the latest insights into fabrication, material characterization, and device integration. The book opens with fundamentals of ferroelectricity and the mechanisms driving HfO2-based ferroelectric behavior, before progressing to detailed examinations of deposition techniques, superlattice structures, and reliability considerations. It further explores a broad spectrum of applications, including non-volatile memories, neuromorphic computing, compute-in-memory architectures, and negative capacitance transistors, alongside emerging roles in energy storage, microwave technologies, and piezoelectric systems. Special attention is given to persistent challenges?such as the wake-up effect, fatigue, and imprint issues?and the strategies developed to mitigate them.
 
An authoritative and well-structured resource for advancing the frontiers of electronic materials and device technologies, HfO2-Based Ferroelectric Materials:
 
* Explains the origins of ferroelectricity in doped HfO2 and its unique material advantages
* Details deposition techniques and approaches to regulating ferroelectric behavior
* Examines device-level challenges, including wake-up effect, fatigue, and imprint reliability
* Highlights applications spanning non-volatile memories, neuromorphic computing, and energy-efficient devices
* Discusses advanced designs such as superlattice-like laminate structures and 3D ferroelectric memories
* Provides insight into the reliability of HfO2-based thin films, capacitors, and field-effect transistors
 
HfO2-Based Ferroelectric Materials: Fabrication, Characterization, and Device Applications is an essential resource for materials scientists, electronics engineers, semiconductor and solid-state physicists, and professionals in the semiconductor and sensor industries. It is also a valuable reference for graduate-level courses in electronic materials, semiconductor devices, and advanced nanotechnology within physics, materials science, and electrical engineering degree programs.

Chapter 1 Fundamentals of ferroelectricity and ferroelectric materials
Chapter 2 Oxygen Vacancy-induced Ferroelectricity in HfO2
Chapter 3 Origin and Multiple Regulations of Ferroelectric Properties in HfO2-Based Materials
Chapter 4 Design of HfO2 ferroelectric materials with superlattice-like laminate structure
Chapter 5 High energy-efficiency computing applications for HfO2-based ferroelectric materials
Chapter 6 1T1C HfO2 FeRAM Materials
Chapter 7 3D Ferroelectric Capacitor Memories for Data-Centric Computing
Chapter 8 Basic Mechanism of Si-channel HfO2-FeFET and its reliability
Chapter 9 Reliability of the Hafnia-based Ferroelectric Memory
Chapter 10 Reliability of HfO2-based ferroelectric thin films and field-effect transistors
Chapter 11 Hafnia-based Materials for Neuromorphic Devices
Chapter 13 HfO2-based Ferroelectric Materials for Energy Storage Applications
Chapter 14 HfO2-based Ferroelectric Materials for Piezoelectric Applications