Radio Frequency Sputtering
Thin-Film Deposition and Device Applications
Radio Frequency Sputtering
Thin-Film Deposition and Device Applications
The book covers the fundamentals and advanced techniques of radiofrequency sputtering, including process optimization, troubleshooting, and sustainability practices. It provides a comprehensive overview of the technique, its applications in various industries, and practical guidance for researchers and engineers. It focuses on established and emerging applications and thus is a must-have reference for researchers in academia and developers in industry.
Part 1: Phenomena
Part 1: Phenomena
1. Mechanistic Understanding of Sputtering
2. Advancement in Sputtering Experimental Set-Up
3. Hybrid Sputtering Systems
4. Phenomenological Understanding of Film Growth by Sputtering
5. Atomic-Scale Understanding of Sputtering-Assisted Film Growth by X-Ray Absorption
Part 2: Film Growth Examples
6. Epitaxial Growth via Radio Frequency Sputtering Process
7. Deposition of Layers for Solar Cells
8. Sputtering-Assisted Growth of Magnetic Thin Films
9. Sputtering for Growth of Oxides from Metal Targets
Part 3: Types of Sputtering
10. Ion Beam Sputtering
11. High Power Pulsed Magnetron Sputtering
12. Reactive Magnetron Sputtering
Part 4: Industrial Applications
13. Sputtering for Development of Magnetic Tunnel Junctions
14. Deposition of Thin Films for AMR Devices
15. Sputtering for Thin Film Batteries
16. Sputtering for Semiconductor Devices
Sharma, Aditya
Lim, Weon Cheol
Sharma, Poorva
Singh, Jitendra Pal
| ISBN | 9783527356225 |
|---|---|
| Medientyp | Buch |
| Auflage | 1. Auflage |
| Copyrightjahr | 2026 |
| Verlag | Wiley-VCH |
| Sprache | Englisch |
